Atomic layer deposition apparatus and loading methods
AssigneePicosun Oy
InventorsSven Lindfors, Juha A. Kustaa-Adolf Poutiainen
Life of this patent
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Abstract
The invention relates to methods and apparatus in which a plurality of ALD reactors are placed in a pattern in relation to each other, each ALD reactor being configured to receive a batch of substrates for ALD processing, and each ALD reactor comprising a reaction chamber accessible from the top. A plurality of loading sequences is performed with a loading robot. Each loading sequence comprises picking up a substrate holder carrying a batch of substrates in a storage area or shelf, and moving said substrate holder with said batch of substrates into the reaction chamber of the ALD reactor in question.
Claims17
An atomic layer deposition (ALD) reactor system comprising:
- a plurality of vertical flow ALD reactors placed in a pattern in relation to each other, each ALD reactor being configured to receive a batch of substrates for ALD processing, each ALD reactor comprising a lid system having a vacuum chamber lid and a reaction chamber lid, and a vacuum chamber accommodating a reaction chamber accessible from the top for loading of the substrates;
- and
- a loading robot comprising a gripping part and a motion arrangement, the loading robot being configured to perform a plurality of loading sequences for loading the reaction chamber of each of said plurality of ALD reactors from the top of the reaction chamber, each loading sequence comprising:
- raising the lid system into an upper position;
- picking up with said gripping part a substrate holder carrying a batch of substrates in a storage area or shelf;
- and
- moving with said moving arrangement said substrate holder with said batch of substrates into the reaction chamber without passing a separate loading chamber, from the top of the reaction chamber, of the ALD reactor in question.
A method comprising:
- operating a plurality of vertical flow ALD reactors placed in a pattern in relation to each other, each ALD reactor being configured to receive a batch of substrates for ALD processing, and each ALD reactor comprising a lid system having a vacuum chamber lid and a reaction chamber lid, and a vacuum chamber accommodating a reaction chamber accessible from the top for loading of the substrates;
- performing a plurality of loading sequences with a loading robot for loading the reaction chamber of each of said plurality of ALD reactors from the top of the reaction chamber, each loading sequence comprising:
- raising the lid system into an upper position, picking up a substrate holder carrying a batch of substrates in a storage area or shelf;
- and
- moving said substrate holder with said batch of substrates into the reaction chamber without passing a separate loading chamber, from the top of the reaction chamber, of the ALD reactor in question.
An atomic layer deposition (ALD) reactor system comprising:
- a vertical flow ALD reactor configured to receive a batch of substrates for ALD processing, and comprising a lid system having a vacuum chamber lid and a reaction chamber lid, and a vacuum chamber accommodating a reaction chamber accessible from the top for loading of the substrates;
- and
- a loading robot comprising a gripping part and a motion arrangement, the loading robot being configured to perform a loading sequence for loading the reaction chamber of said ALD reactor from the top of the reaction chamber, the loading sequence comprising:
- raising the lid system into an upper position;
- picking up with said gripping part a substrate holder carrying a batch of substrates in a storage area or shelf;
- and
- moving with said moving arrangement said substrate holder with said batch of substrates into the reaction chamber without passing a separate loading chamber, from the top of the reaction chamber, of the ALD reactor.
Dependencies are inferred from the claim text.