Calibration substrate and method of calibration therefor
OwnerRoland Schanz, Christoph Merkl +1inventors
InventorsRoland Schanz, Christoph Merkl, Steffen Müller
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Abstract
A system and method is disclosed that reliably determines the transmissivity of a substrate. By determining the transmissivity of a calibration substrate, for instance, a temperature measuring device can be calibrated. The method and system are particularly well suited for use in thermal processing chambers that process semiconductor wafers used for forming integrated circuit chips.
Claims40
A disk-shaped substrate for calibrating a temperature measuring device in a device for the thermal treatment of semiconductor wafers, wherein the substrate comprises at least partly of a first material which changes its transmission characteristic in dependence on its temperature, characterized by at least one passage opening in the first material which is arranged at a distance r1 from the center point of the substrate and forms a free passage for optical radiation through the substrate at least in a partial region, characterized in that the substrate comprises at least a second material which is arranged at a distance r from the center point of the substrate.
A disk-shaped substrate for calibrating a temperature measuring device in a device for the thermal treatment of semiconductor wafers, wherein the substrate comprises at least partly of a first material which changes its transmission characteristic in dependence on its temperature, characterized by at least one passage opening in the first material which forms a free passage for optical radiation through the substrate at least in a partial region, characterized in that the first material is a first semiconductor wafer comprising a silicon wafer which has a foreign substance doping of at least 5×1E17 cm-3.
Dependencies are inferred from the claim text.