Substrate processing apparatus, and magnetic recording medium manufacturing method

A substrate processing apparatus capable of applying an ion beam to a substrate including an opening to perform predetermined processing, the apparatus comprising:

• a first ion beam generator including a first ion extraction mechanism for extracting ions in a plasma;
• and
• a second ion beam generator including a second ion extraction mechanism for extracting ions in a plasma, the second ion beam generator being arranged opposite the first ion beam generator, wherein
• each of the first ion beam generator and the second ion beam generator is arranged so as to apply an ion beam to a region between the first ion beam generator and the second ion beam generator;
• the first extraction mechanism includes a first grid, and the second extraction mechanism includes a second grid;
• the first grid includes a first occluded region, and the second grid includes a second occluded region;
• and
• when a substrate carrier that holds the substrate is arranged in the region, the first and second occluded regions are positioned so that at least a part of the opening is positioned between the first and second occluded regions.