Defect inspection system and method of the same
AssigneeHitachi High-Technologies Corporation
InventorsYuta Urano, Kaoru Sakai, Shunji Maeda
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AssigneeHitachi High-Technologies Corporation
InventorsYuta Urano, Kaoru Sakai, Shunji Maeda
Estimating the term…
In an inspection subject substrate, there is a problem that a defect signal is overlooked due to scattered light from a pattern and sensitivity decreases in an irregular circuit pattern part. The inventors propose a defect inspection method, characterized by comprising: an illumination step of guiding light emitted from a light source to a predetermined area on an inspection subject substrate under a plurality of predetermined optical conditions; a detection step of obtaining an electric signal by guiding scattered light components propagating in a predetermined range of azimuthal angle and in a predetermined range of elevation angle to a detector for each of a plurality of scattered light distributions occurred correspondingly to the plurality of optical conditions in the predetermined area; and a defect determination step of determining a defect based on the plurality of electric signals obtained in the detection step.
A defect inspection method, comprising:
A defect inspection method for inspecting a defect on an inspection subject on a substrate, comprising:
A defect inspection method, comprising:
Dependencies are inferred from the claim text.