Measurement system and measurement processing method

A measurement processing method in a measurement system, the method comprising the steps of:

• causing an irradiation unit to irradiate a measurement target with predetermined pattern light at a predetermined incident angle;
• causing a reception unit to receive, at a reflection angle substantially equal to the incident angle, reflected light of the pattern light irradiating the measurement target;
• causing a first extraction unit to extract information about a surface shape of the measurement target in a region irradiated with the pattern light, based on a shift amount between a light receiving position of the reflected light received in the step of causing a reception unit to receive reflected light, and a predetermined reference position;
• causing a second extraction unit to extract, as information about a scattering characteristic of the measurement target in the region irradiated with the pattern light, information about a luminance value of the reflected light received in the step of causing a reception unit to receive reflected light, and information indicating a spread of the pattern light upon reflection by the measurement target;
• and
• causing a control unit to control the pattern light emitted by the irradiation unit to have an interval at which outer edges of adjacent patterns are in contact with each other in an image obtained by receiving the reflected light by said reception unit on the basis of the information about the scattering characteristic of the measurement target that is extracted in the step of causing a second extraction unit to extract information.