Stage device, pattern formation apparatus, exposure apparatus, stage drive method, exposure method, and device manufacturing method
AssigneeNikon Corporation
InventorYuichi Shibazaki
Life of this patent
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AssigneeNikon Corporation
InventorYuichi Shibazaki
Estimating the term…
A stage device is equipped with: a wafer stage that has a coarse movement stage that moves along an XY plane and a table that is finely movable in at least a direction parallel to the XY plane; and an encoder system. A plurality of encoder heads are arranged on the coarse movement stage. Each of the heads irradiates a first grating section placed parallel to the XY plane and a second grating section arranged on the table with measurement beams, respectively, and receives diffracted lights from each of the first and second grating sections. The encoder system measures positional information of the table (wafer stage) within the XY plane based on an output of at least one encoder head that faces the first and second grating sections.
A stage device, comprising:
A stage device, comprising:
A stage device, comprising:
A stage drive method of driving a coarse/fine movement stage that has a coarse movement stage that moves along a predetermined plane and a fine movement stage that is finely movable on the coarse movement stage, the method comprising:
A stage drive method of driving a coarse/fine movement stage that has a coarse movement stage that moves along a predetermined plane and a fine movement stage that is finely movable on the coarse movement stage, the method comprising:
A stage drive method of driving a coarse/fine movement stage that has a coarse movement stage that moves along a predetermined plane and a fine movement stage that is finely movable on the coarse movement stage, the method comprising:
Dependencies are inferred from the claim text.