Reflective, refractive and projecting optical system; reflective, refractive and projecting device; scanning exposure device; and method of manufacturing micro device

A scanning exposure apparatus which transfers a pattern of a first object onto a second object while projecting an image of the first object placed on a first plane, onto the second object placed on a second plane and changing a positional relation between the image of the first object and the second object in a scanning direction, the scanning exposure apparatus comprising:

• a first row of projection optical systems comprising a plurality of first projection optical systems each having a first field of view on the first plane and on a first row along a non-scanning direction being a direction crossing the scanning direction, the first projection optical system having a first beam shifter which shifts light from the first field of view in a first direction substantially parallel to the scanning direction and guides the light from the first field of view to a first projection region located, as shifted relative to the first field of view in the first direction with reference to a direction along the first plane;
• and
• a second row of projection optical systems comprising a plurality of second projection optical systems each having a second field of view on the second plane and on a second row being a row along the non-scanning direction and different from the first row, the second projection optical system having a second beam shifter which shifts light from the second field of view in a second direction opposite to the first direction and guides the light from the second field of view to a second projection region located, as shifted relative to the second field of view in the second direction with reference to a direction along the first plane;
• wherein the first row of projection optical systems form a plurality of projection regions conjugate with the plurality of field of views of the first row of projection optical systems, on a third row on the second plane;
• and
• wherein the second row of projection optical systems form a plurality of projection regions conjugate with the plurality of field of views of the second row of projection optical systems, on a fourth row on the second plane;
• the scanning exposure apparatus satisfying the following relation:
• Dp=|β|×Dm,
• where Dm is a first interval being an interval along the scanning direction on the first plane between the first row and the second row, Dp is a second interval being an interval along the scanning direction on the second plane between the third row and the fourth row, and β is a magnification of the first and second projection optical systems.

A catadioptric projection optical system which forms an image of a first object placed on a first plane, at a projection magnification with an enlargement on a second object placed on a second plane, the projection optical system comprising:

• a concave reflecting mirror disposed in an optical path between the first plane and the second plane;
• a first lens unit disposed in an optical path between the first plane and the concave reflecting mirror;
• a second lens unit disposed in an optical path between the first lens unit and the concave reflecting mirror, the second lens unit having an optical axis substantially parallel to an optical axis of the first lens unit;
• a first deflecting member disposed in an optical path between the second lens unit and the second plane and adapted to deflect light so as to traverse the optical axis of the first lens unit;
• a second deflecting member disposed in an optical path between the first deflecting member and the second plane;
• and
• a third lens unit disposed in an optical path between the second deflecting member and the second plane and having an optical axis substantially parallel to the optical axis of the first lens unit,
• wherein the first deflecting member deflects light from the concave reflecting mirror in a first direction substantially parallel to the first plane;
• and
• wherein the second deflecting member deflects the light from the first deflecting member in a direction substantially parallel to the optical axis of the first lens unit.