Inductor devices
AssigneeIndustrial Technology Research Institute
InventorsChang-Lin Wei, Kuo-Chiang Chin, Cheng-Hua Tsai, Chin-Sun Shyu, Chang-Sheng Chen
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Abstract
An inductor device comprising a first conductive pattern on a first layer of a substrate, a second conductive pattern on a second layer of the substrate, and a first region between the first layer and the second layer through which at least one hole is coupled between the first dielectric layer and the second dielectric layer, wherein a magnetic field induced by at least one of the first conductive pattern or the second conductive pattern at the first region is more intensive than that induced by at least one of the first conductive pattern or the second conductive pattern at a second region between the first conductive layer and the second conductive layer.
Claims12
An inductor device comprising:
- a substrate comprising a plurality of substrate layers including at least a first substrate layer and a second substrate layer arranged beneath the first substrate layer;
- a conductive coil disposed on the first substrate layer and winding around a first area on a surface of the first substrate layer, the conductive coil comprising two terminals and a plurality of conductive windings;
- and
- a second area on the surface of the first substrate layer at which at least one hole is provided through the surface of the first substrate layer, the second area being substantially surrounded by at least one of the plurality of conductive windings and the hole being disconnected from the conductive coil.
Dependencies are inferred from the claim text.