Back to results
US 8,274,049 B2Granted
Sample processing and observing method
AssigneeSII NanoTechnology Inc.
InventorsKeiichi Tanaka, Yo Yamamoto, Xin Man, Junichi Tashiro, Toshiaki Fujii
Life of this patent
Estimating the term…
Abstract
There is provided a sample processing and observing method including irradiating a focused ion beam to a sample to form an observed surface, irradiating an electron beam to the observed surface to form an observed image, removing the surface opposite to the observed surface of the sample, forming a lamella including the observed surface and obtaining a transmission observed image for the lamella.
Claims7
A sample processing and observing method comprising:
- an observed surface forming step of irradiating a focused ion beam to the sample in a direction substantially parallel to an observed surface so as to remove a surface of the sample and exposing the observed surface;
- an observed image obtaining step of irradiating a charged particle beam to the observed surface in a direction substantially perpendicular to the observed surface, detecting generated secondary charged particles, and forming an observed image;
- a lamella forming step of irradiating the focused ion beam to the sample in a direction substantially parallel to the observed surface, removing a surface opposite to the observed surface of the sample, and forming a lamella including the observed surface;
- and
- a transmission observed image obtaining step of irradiating the charged particle beam to the lamella in the direction substantially perpendicular to the observed surface, detecting transmitted charged particles which are transmitted through the lamella, and forming a transmission observed image.
2 more elements
Dependencies are inferred from the claim text.