# US 8,273,830 B2 · Deprotection method of protected polymer > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 8,273,830 B2 - Document ID: US8273830B2 - Status: Granted - Kind: B2 - Application number: 12/901,903 - Filed: 2010-10-11 - Published: 2011-04-14 - Granted: 2012-09-25 - Earliest claimed: 2009-10-13 - Assignees: Shin-Etsu Chemical Co., Ltd. - Inventors: Keiichi Masunaga; Takeru Watanabe; Daisuke Domon; Satoshi Watanabe - Web page: https://patentgrep.com/patent/US8273830B2 ## CPC - G03F 7/0392: {the macromolecular compound being present in a chemically amplified positive photoresist composition} - C08F 8/12: Hydrolysis - C08F 212/22: {Oxygen} - C08F 220/1807: {C7-(meth)acrylate, e.g. heptyl (meth)acrylate or benzyl (meth)acrylate} - C08F 220/1809: {C9-(meth)acrylate} - G03F 7/0382: {the macromolecular compound being present in a chemically amplified negative photoresist composition} - C08F 212/32: containing two or more rings - C08F 220/1804: {C4-(meth)acrylate, e.g. butyl (meth)acrylate, isobutyl (meth)acrylate or tert-butyl (meth)acrylate} - G03F 7/0397: {the macromolecular compound having an alicyclic moiety in a side chain} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - C08F: MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS ## Abstract Provided is a method of deprotecting a protected polymer, the method being capable of, in the deprotection reaction of a polymer comprising a unit structure having a phenolic hydroxyl group protected with an acyl group, deacylating the polymer in a short period of time while maintaining the other structure, and being capable of taking out the deacylated polymer while highly suppressing contamination of the deacylated polymer with a substance other than the polymer taking part in the reaction. More specifically, provided is a method of deprotecting a protected polymer comprising at least a step of dissolving in an organic solvent the protected polymer comprising at least a unit structure having a phenolic hydroxyl group protected with an acyl group and a deprotecting reagent selected from primary or secondary amine compounds each having a ClogP value of 1.00 or less with the proviso that in the secondary amine compound, neither of the two carbon atoms coupled to the nitrogen atom of the amino group is tertiary. The primary or secondary amine compounds are each represented preferably by HNR12-nR2n (1). ## Claims ### Claim 1 A method of deprotecting a protected polymer, comprising at least a step of dissolving in an organic solvent the protected polymer comprising at least a unit structure having a phenolic hydroxyl group protected with an acyl group and a deprotecting reagent selected from the group consisting of primary and secondary amine compounds each having a ClogP value of 1.00 or less with the proviso that in the secondary amine compound, neither of the two carbon atoms coupled to the nitrogen atom of the amino group is tertiary, to deprotect the protected polymer; wherein said primary amine and secondary amine compounds are represented by the formula (1): HNR12-nR2n (1) wherein R1 represents a hydrogen atom or a linear, branched or cyclic C1-6 alkyl group, R2 independently represents a linear, branched or cyclic C2-7 alkyl group comprising at least one oxygen atom or at least one nitrogen atom, two R2s may be coupled to each other to form a cyclic structure comprising at least one oxygen atom and/or at least one nitrogen atom, and n stands for 1 or 2. ### Claim 2 (depends on 1) The method of deprotecting a protected polymer according to claim 1, wherein a part or all of R2n in the formula (1) has a structure represented by the following formula (2): wherein R3, R4, R5, R6, R7 and R8 each independently represents a hydrogen atom or a C1-4 alkyl group, X represents a hydroxyl group, an amino group or an alkylamino group, m stands for 0 or 1, and (N) is a symbol representing an attachment site to the nitrogen of R2. ### Claim 3 (depends on 1) The method of deprotecting a protected polymer according to claim 1, wherein said protected polymer further comprises a unit structure having an ester structure derived from an aliphatic alcohol. ### Claim 4 (depends on 1) A method of producing a base polymer for chemically amplified resist, comprising a step of: carrying out the method of deprotecting as claimed in claim 1. ### Claim 5 (depends on 2) The method of deprotecting a protected polymer according to claim 2, wherein said protected polymer further comprises a unit structure having an ester structure derived from an aliphatic alcohol. ### Claim 6 (depends on 2) A method of producing a base polymer for chemically amplified resist, comprising a step of: carrying out the method of deprotecting as claimed in claim 2. ### Claim 7 (depends on 3) A method of producing a base polymer for chemically amplified resist, comprising a step of: carrying out the method of deprotecting as claimed in claim 3.