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AssigneesRenesas Electronics Corporation, Ulvac, Inc.
InventorsShinichi Chikaki, Takahiro Nakayama
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A process for manufacturing a hydrophobized microporous film includes: forming an organic silica insulating film 2 on a substrate 1; supplying a gaseous mixture 3 composed of a silylation gas and an inert gas in an apparatus having the substrate 1 disposed therein at a temperature of the substrate 1, the substrate 1 having the organic silica insulating film 2 formed thereon, and the temperature being equal to or higher than a dew point temperature of the silylation gas and equal to or lower than a vaporizing temperature of the silylation gas; stopping the supply of the gaseous mixture 3 into the apparatus; and heating the substrate having the organic silica insulating film 2 formed thereon, so that a hydrophobizing organic silica insulating film, in which the surface of the organic silica insulating film 2 and the surfaces of the pores are hydrophobized, can be obtained with reduced increase in the specific dielectric constant.
A process for manufacturing a hydrophobized microporous film, including:
Dependencies are inferred from the claim text.