Method for purification of silicon tetrachloride
AssigneesJnc Corporation, JX Nippon Mining & Metals Corporation, Toho Titanium Co., Ltd.
InventorsSatoshi Hayashida, Harumichi Semoto
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Abstract
An object of the present invention is to provide a method for purification of silicon tetrachloride which solves the problems of separating and removing organic chlorosilanes by distillation or adsorption. The method for purification of silicon tetrachloride comprises the steps of (1) bringing a mixed gas including a silicon tetrachloride gas and an oxygen-containing gas into contact with a catalyst layer which is controlled to a temperature of 200 to 450° C. and which includes at least one selected from the group consisting of activated carbon and metal-supporting activated carbon, and (2) cooling the mixed gas after brought into contact to separate and recover liquid silicon tetrachloride.
Claims5
A method for purification of silicon tetrachloride comprising the steps of:
- (1) bringing a mixed gas comprising a silicon tetrachloride gas and an oxygen-containing gas into contact with a catalyst layer which is controlled to a temperature of 200 to 450° C. and which comprises at least one selected from the group consisting of activated carbon and metal-supporting activated carbon, and
- (2) cooling the mixed gas after brought into contact to separate and recover liquid silicon tetrachloride.
Dependencies are inferred from the claim text.