Back to results
US 8,273,270 B2Granted
Photosensitive resin composition and light blocking layer using the same
AssigneeCheil Industries Inc.
InventorsChang-Min Lee, Kil-Sung Lee, Jun-Seok Kim, Jung-Sik Choi
Life of this patent
Estimating the term…
Abstract
Disclosed are a photosensitive resin composition that includes (A) a cardo-based resin including repeating units represented by the following Chemical Formulae 1 and 2, wherein the substituents of Chemical Formulae 1 and 2 are the same as defined in the specification, (B) reactive unsaturated compound, (C) a pigment, (D) an initiator, and (E) a solvent, and a light blocking layer using the photosensitive resin composition.
Claims13
A photosensitive resin composition comprising:
- (A) a cardo-based resin including repeating units represented by the following Chemical Formulae 1 and 2;
- (B) a reactive unsaturated compound;
- (C) a pigment;
- (D) an initiator;
- and
- (E) a solvent:
- wherein, in Chemical Formulae 1 and 2,
- R3, R4, R13 and R14 are the same or different and are independently hydrogen, halogen, or substituted or unsubstituted C1 to C20 alkyl,
- R1 and R2 are the same or different and are independently hydrogen or substituted or unsubstituted (meth)acrylate,
- R11 and R12 are the same or different and are independently substituted or unsubstituted (meth)acrylate,
- R5 is a substituent including an ethylenic double bond,
- Z1 and Z11 are the same or different and are independently a single bond, O, CO, SO2, CR6R7, SiR8R9, wherein, R6 to R9 are the same or different and are independently hydrogen or substituted or unsubstituted C1 to C20 alkyl, or at least one of linking groups represented by the following Chemical Formulae 3-1 to 3-11,
- Z2 and Z12 are the same or different and are independently an acid anhydride residual group or an acid dianhydride residual group,
- m1, m2, m11, and m12 are independently integers ranging from 0 to 4, and
- n1 and n11 independently range from 1 to 30,
- wherein, in Chemical Formula 3-5,
- Ra is hydrogen, ethyl, C2H4Cl, C2H4OH, CH2CH═CH2, or phenyl,
- wherein, in Chemical Formula 2, R5 is a substituent represented by the following Chemical Formula 4-1 or 4-2,
- wherein, in Chemical Formula 4-1,
- Q is hydrogen or substituted or unsubstituted C1 to C20 alkyl, and
- wherein, in Chemical Formula 4-2,
- X1 to X5 are the same or different and are independently hydrogen, halogen, substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C6 to C30 aryl, substituted or unsubstituted amine, or substituted or unsubstituted C1 to C20 alkoxy, and
- i is an integer ranging from 0 to 5.
20 more elements
Dependencies are inferred from the claim text.