Etching method and etching apparatus of semiconductor wafer
AssigneeSumco Techxiv Corporation
InventorsKazuaki Kozasa, Tomonori Kawasaki
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Abstract
A method of etching a semiconductor wafer is provided. The method comprises the steps of: jetting a mixed gas including hydrogen fluoride and ozone onto a surface of a semiconductor wafer; monitoring the surface of the semiconductor wafer; analyzing the surface of the semiconductor wafer; and adjusting at least one of the hydrogen fluoride concentration and the ozone concentration in the mixed gas based on a result of the analysis.
Claims9
A method of etching a semiconductor wafer having a marker inside comprising the steps of:
- jetting a mixed gas including hydrogen fluoride and ozone onto a surface of a semiconductor wafer;
- monitoring the surface of the semiconductor wafer to detect the marker;
- analyzing the surface of the semiconductor wafer to calculate an optimal hydrogen fluoride concentration and an optimal ozone concentration for selective etch;
- and
- adjusting at least one of a hydrogen fluoride concentration and an ozone concentration in the mixed gas based on a result of an analysis of the step of analyzing.
A method of manufacturing a silicon-on-insulator (SOI) wafer from first and second silicon wafers comprising the steps of:
- preparing the first and second silicon wafers;
- ion-implanting oxygen in the first wafer;
- thermally oxidizing the first wafer to form silicon oxide films on both surfaces thereof;
- adhering an ion-implanted surface side of the first wafer to the second wafer;
- polishing another surface of the first wafer adhered to the second wafer;
- jetting a mixed gas including hydrogen fluoride and ozone onto a polished surface of the first silicon wafer;
- monitoring the surface of the first silicon wafer;
- analyzing the surface of the first silicon wafer;
- and
- adjusting at least one of a hydrogen fluoride concentration and an ozone concentration in the mixed gas based on a result of an analysis.
Dependencies are inferred from the claim text.