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US 8,273,221 B2Granted
Sputter target utilization
AssigneeOerlikon Solar AG, Trubbach
InventorsStefan Schneider, Marcel Muller, Jiri Vyskocil, Israel Wagner
Life of this patent
Estimating the term…
Abstract
An apparatus and method are provided for improved utilization of a sputter target in the longitudinal end regions. The focus of erosion in the end regions is widened, thereby extending the useful life of the target. This provides improved efficiency and reduces waste because a greater proportion of the target material in the more expansive central region can be harvested, because the target is utilized for a longer period of time.
Claims14
A sputtering apparatus comprising:
- a magnetic assembly with an outer magnet frame surrounding a central magnetic arrangement, said outer magnet frame including first and second longitudinally extending magnetic lateral members located on either side of the central magnetic arrangement, and first and second magnetic end members located at and defining opposite longitudinal ends of said frame;
- a rectangular sputter target disposed over said magnetic assembly during operation, said sputter target having a central region, first and second longitudinal end regions, and a long axis, said magnetic assembly being effective to generate a magnetic field above the sputter target, with said central magnetic arrangement of the magnetic assembly being movable with respect to said outer magnet frame and being effective to produce a non-static modulation in said magnetic field above said central region of said target;
- said first and second magnetic end members being movable perpendicular to the long axis of the target in at least a first direction relative to said first and second longitudinally extending lateral members and being effective to produce a nonstatic modulation in said magnetic field above said first longitudinal end region of said target.
Dependencies are inferred from the claim text.