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AssigneeLam Research Corporation
InventorsGregory R. Bettencourt, Gautam Bhattacharyya, Simon Gosselin Eng, Sandy Chao
Estimating the term…
An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A thermally and electrically conductive gasket with projections thereon is compressed between the showerhead electrode and the backing plate at a location three to four inches from the center of the showerhead electrode. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the electrode.
A gasket for a showerhead electrode assembly in which a showerhead electrode is clamped to a backing plate, said gasket comprising an annular strip of thermally and electrically conductive material and a plurality of projections on a surface thereof, the annular strip having an outer diameter smaller than an outer diameter of the showerhead electrode, and each of the projections having a height at least two times greater than the thickness of the annular strip.
Dependencies are inferred from the claim text.