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AssigneeNippon Steel Corporation
InventorsFumiaki Takahashi, Kazutoshi Takeda, Hiroyasu Fujii, Shuichi Yamazaki, Yoshiaki Natori
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A grain-oriented electrical steel sheet has a tension film that does not include chromium. In the present invention, the tension film, including a phosphate and silica as constituents, includes a manganese compound and a potassium compound. The mole ratio K/Mn of potassium to manganese in the film is set to a certain range. The film can be produced by preparing a coating solution by adding a compound, which includes the phosphate and the silica and also includes the potassium and the manganese, and applying the coating solution on a grain-oriented electrical steel sheet after final annealing is completed, followed by drying and baking.
A grain-oriented electrical steel sheet comprising a film on an outermost surface of a steel sheet, wherein the film comprises a phosphate, a silica, a manganese compound, and a potassium compound, wherein the phosphate includes one or more metals selected from the group consisting of Al, Mg, Ni, Mn, Co, Mo, Zr, Sr, and Ca, wherein relative amounts of the phosphate, the silica, and the manganese compound in the film are 100 parts by mass of the phosphate expressed as a solid material, 20 to 80 parts by mass of the silica expressed as a solid material, and 0.5 to 15 parts by mass of the manganese compound other than the phosphate expressed as a manganese dioxide, and wherein a mole ratio K/Mn of potassium to manganese is 0.02 to 2.0.
A method of producing a grain-oriented electrical steel sheet, the method comprising:
A grain-oriented electrical steel sheet comprising a film on an outermost surface of a steel sheet, wherein the film comprises a phosphate, a silica, a manganese compound, and a potassium compound, wherein the phosphate includes one or more metals selected from the group consisting of Al, Mg, Ni, Mn, Co, Mo, Zr, Sr, and Ca, wherein relative amounts of the phosphate, the silica, and the manganese compound in the film are 100 parts by mass of the phosphate expressed as a solid material, 20 to 80 parts by mass of the silica expressed as a solid material, and 0.5 to 15 parts by mass of the manganese compound other than the phosphate expressed as a manganese dioxide, wherein a mole ratio K/Mn of potassium to manganese is 0.02 to 2.0, and wherein the film is formed by drying a solution having a solid material in the range of 5 mass % or more and 50 mass % or less.
Dependencies are inferred from the claim text.