Exposure apparatus, exposure method, and method of manufacturing device

An exposure apparatus comprising:

• a moving mechanism that moves a first portion of a belt-shaped substrate that has photosensitivity in a first heading along a first direction and that moves a second portion of the substrate in a second heading that is opposite to the first heading along the first direction;
• a stage mechanism that holds a mask that has a pattern, and moves in a third heading along a second direction in synchronization with the movement in the first direction of the first portion and the second portion;
• and
• a projection optical system that receives light via the pattern, forms a first projection image of the pattern on the first portion so that the third heading on the mask and the first heading on the first portion optically correspond, and forms a second projection image of the pattern on the second portion so that the third heading on the mask and the second heading on the second portion optically correspond.