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US 8,264,664 B2Granted
Method for producing a marker on a substrate, lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsMaurits Van Der Schaar, Jacobus Burghoorn, Richard Johannes Franciscus Van Haren, Everhardus Cornelis Mos, Rene Monshouwer
Life of this patent
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Abstract
A method of producing a marker on a substrate includes projecting a patterned beam on a layer of resist disposed on a substrate in a lithographic apparatus to create a latent marker; and locally heating the substrate at the marker location in the lithographic apparatus to transform the latent marker into a detectable marker.
Claims10
A lithographic apparatus comprising:
- an illumination system configured to condition a beam of radiation;
- a support structure configured to support a patterning structure, the patterning structure serving to impart the beam of radiation with a pattern in the radiation beam's cross-section;
- a substrate table configured to hold a substrate;
- a projection system configured to project the patterned beam onto a target portion of the substrate;
- and
- an internal heat generating device located within the lithographic apparatus and a heat generating portion of the heat generating device being positionable proximate the substrate and operable to locally heat the substrate to transform a latent marker on said substrate into a detectable marker, the internal heat generating device further comprising a heat generating element located within the lithographic apparatus, the heat generating element being heated to cause the local heating of the substrate to transform the latent marker.
3 more elements
A lithographic apparatus comprising:
- an illumination system configured to condition a beam of radiation;
- a support structure configured to support a patterning structure, the patterning structure serving to impart the beam of radiation with a pattern in the radiation beam's cross-section;
- a substrate table configured to hold a substrate;
- a projection system configured to project the patterned beam onto a target portion of the substrate;
- and
- an internal heat generating device located within the lithographic apparatus and a heat generating portion of the heat generating device being positionable proximate the substrate and operable to locally heat the substrate to transform a latent marker on said substrate into a detectable marker, the internal heat generating device further comprising a heat generating element located within the lithographic apparatus, the heat generating element being heated during local heating of the substrate wherein the internal heat generating device is configured to provide an alternating magnetic field to the latent marker, thereby inductively heating the latent marker.
3 more elements
A lithographic apparatus comprising:
- an illumination system configured to condition a beam of radiation;
- a support structure configured to support a patterning structure, the patterning structure serving to impart the beam of radiation with a pattern in the radiation beam's cross-section;
- a substrate table configured to hold a substrate;
- a projection system configured to project the patterned beam onto a target portion of the substrate;
- and
- an internal heat generating device located within the lithographic apparatus and a heat generating portion of the heat generating device being positionable proximate the substrate and operable to locally heat the substrate to transform a latent marker on said substrate into a detectable marker;
- wherein the internal heat generating device further comprises a heat generating element, and
- wherein the lithographic apparatus is configured to press the heat generating element and the latent marker into physical contact with one another.
5 more elements
Dependencies are inferred from the claim text.