Color filter substrate for in-plane switching mode liquid crystal display device and method of fabricating the same

A color filter substrate for an in-plane switching mode liquid crystal display device, comprising:

• a first rear side electrode on a first surface of a substrate and formed of a first transparent conductive material including zinc oxide (ZnO) and at least two compounds comprising second or fourth valence, the first rear side electrode comprising a first thickness;
• a black matrix comprising a lattice shape and a plurality of openings in the lattice shape, the black matrix disposed on a second surface, which is opposite to the first surface, of the substrate;
• a color filter layer in the plurality of openings;
• and
• an overcoat layer on the black matrix and the color filter layer,
• wherein the first transparent conductive material includes ZnO of about 95 to about 98.8 weight %, Al2O3 of about 1 to about 3 weight %, and Ga2O3 of about 0.2 to about 2 weight %.

A color filter substrate for an in-plane switching mode liquid crystal display device, comprising:

• a first rear side electrode on a first surface of a substrate and formed of a first transparent conductive material including zinc oxide (ZnO) and at least two compounds comprising second or fourth valence, the first rear side electrode comprising a first thickness;
• a black matrix comprising a lattice shape and a plurality of openings in the lattice shape, the black matrix disposed on a second surface, which is opposite to the first surface, of the substrate;
• a color filter layer in the plurality of openings;
• an overcoat layer on the black matrix and the color filter layer;
• and
• a second rear side electrode formed of a second transparent conductive material of indium-tin-oxide (ITO) or indium-zinc-oxide (IZO) and comprising a second thickness,
• wherein the second rear side electrode is positioned between the second surface and the first rear side electrode, or the first rear side electrode is positioned between the second surface and the second rear side electrode.

A method of fabricating a color filter substrate for an in-plane switching mode liquid crystal display device, the method comprising:

• forming a first rear side electrode on a first surface of a substrate and formed of a first transparent conductive material including zinc oxide (ZnO) and at least two compounds comprising second or fourth valence, the first rear side electrode comprising a first thickness;
• forming a black matrix comprising a lattice shape and a plurality of openings in the lattice shape, the black matrix disposed on a second surface, which is opposite to the first surface, of the substrate;
• forming a color filter layer in the plurality of openings;
• and
• forming an overcoat layer on the black matrix and the color filter layer,
• wherein the first transparent conductive material includes ZnO of about 94.95 to about 98.79 weight %, Al2O3of about 1 to about 3 weight %, Ga2O3 of about 0.2 to about 2 weight %, and CaO of about 0.01 to about 0.05 weight %.

A method of fabricating a color filter substrate for an in-plane switching mode liquid crystal display device, the method comprising:

• forming a first rear side electrode on a first surface of a substrate and formed of a first transparent conductive material including zinc oxide (ZnO) and at least two compounds comprising second or fourth valence, the first rear side electrode comprising a first thickness;
• forming a black matrix comprising a lattice shape and a plurality of openings in the lattice shape, the black matrix disposed on a second surface, which is opposite to the first surface, of the substrate;
• forming a color filter layer in the plurality of openings;
• and
• forming an overcoat layer on the black matrix and the color filter layer,
• wherein the first transparent conductive material includes ZnO of about 95 to about 98.8 weight %, Al2O3 of about 1 to about 3 weight %, and Ga2O3 of about 0.2 to about 2 weight %.

A method of fabricating a color filter substrate for an in-plane switching mode liquid crystal display device, the method comprising:

• forming a first rear side electrode on a first surface of a substrate and formed of a first transparent conductive material including zinc oxide (ZnO) and at least two compounds comprising second or fourth valence, the first rear side electrode comprising a first thickness;
• forming a black matrix comprising a lattice shape and a plurality of openings in the lattice shape, the black matrix disposed on a second surface, which is opposite to the first surface, of the substrate;
• forming a color filter layer in the plurality of openings;
• and
• forming an overcoat layer on the black matrix and the color filter layer,
• wherein forming a second rear side electrode, which is formed of a second transparent conductive material of indium-tin-oxide (ITO) or indium-zinc-oxide (IZO) and comprising a second thickness, is performed before forming the first rear side electrode such that the second rear side electrode is positioned between the second surface and the first rear side electrode, or is performed after forming the first rear side electrode such that the first rear side electrode positioned between the second surface and the second rear side electrode.