Semiconductor device and semiconductor device manufacturing method

A semiconductor device comprising:

• first and second conductors provided in a surface of a semiconductor substrate or at positions over and away from the semiconductor substrate, and having upper faces flush with each other;
• an insulating film formed so as to cover the upper faces of the first and second conductors, and having a uniform film thickness;
• a first conductor plug formed in the insulating film, and connected to the first conductor;
• a second conductor plug formed in the insulating film, having a lower height than the first conductor plug, and directly connected to the second conductor;
• a first interconnection layer having a lower end portion connected to an upper end portion of the first conductive plug, the first interconnection layer being embedded in the insulating film, and an upper face of the first interconnection layer being flush with the insulating layer;
• and
• a second interconnection layer having a lower end portion connected to an upper end portion of the second conductive plug, the second interconnection layer being embedded in the insulating film, and an upper face of the second interconnection layer being flush with the insulating film, and the second interconnection layer is wider than the first interconnection layer.