Mass analysis magnet for a ribbon beam
AssigneeVarian Semiconductor Equipment Associates, Inc.
InventorsVictor Benveniste, James S. Buff, Frank Sinclair, Joseph C. Olson
Life of this patent
Estimating the term…
Abstract
A ribbon beam mass analyzer having a first and second solenoid coils and steel yoke arrangement. Each of the solenoid coils have a substantially “racetrack” configuration defining a space through which an ion ribbon beam travels. The solenoid coils are spaced apart along the direction of travel of the ribbon beam. Each of the solenoid coils generates a uniform magnetic field to accommodate mass resolution of wide ribbon beams to produce a desired image of ions generated from an ion source.
Claims27
An ion mass analyzer for performing mass analysis of different ion species within a traveling ribbon ion beam and produce an image thereof, said analyzer comprising:
- a first solenoid coil defining a space through which an ion ribbon beam passes, said first solenoid coil configured to generate a first magnetic field in a first direction in response to an applied current to alter trajectories associated with ions within said ion ribbon beam traveling through said to space of said first solenoid coil based on a respective mass of each of said ions;
- a second solenoid coil spaced a distance “d” downstream from said first solenoid coil in the direction of said traveling ion ribbon beam, said second solenoid coil defining a space through which said ion ribbon beam received from said first solenoid coil travels, said second solenoid coil configured to generate a second magnetic field in response to applied current such that said second magnetic field is in an opposite direction from said first magnetic field;
- said second solenoid coil configured to further bend the trajectory of the ions received within said ion ribbon beam from the first solenoid coil based on the respective mass of each of said ions;
- at least one yoke having a first recess and a second recess, said first recess configured to receive a portion of said first solenoid coil and the second recess configured to receive a portion of said second solenoid coil, said yoke connected to said first and second solenoid coils to complete a circuit formed between said yoke, said first solenoid coil and said second solenoid coil.
An ion implantation system comprising:
- an ion source operable to generate a ribbon ion beam;
- a mass analyzer having an entrance and an exit configured to receive a traveling ion ribbon ion beam from the ion source via the entrance and deflect ions within the ribbon beam having a desired charge-to-mass ratio along a predetermined path for output to the exit of the mass analyzer, said mass analyzer comprising:
- a first and second solenoid coils spaced a specified distance apart, each of said solenoid coils defining a space through which said ribbon ion beam travels;
- and
- a yoke having a first recess adapted to receive a first portion of said first solenoid coil and a second recess adapted to receive a first portion of said second solenoid coil;
- and
- an end station downstream of the mass analyzer configured to support a workpiece for implantation thereof via the ribbon beam.
Dependencies are inferred from the claim text.