Dynamic multi-purpose composition for the removal of photoresists and methods for its use
AssigneeDynaloy, LLC
InventorsMichael T. Phenis, Diane Marie Scheele, Kimberly Dona Pollard
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Abstract
Improved dry stripper solutions for removing one, two or more photoresist layers from substrates are provided. The stripper solutions comprise dimethyl sulfoxide, a quaternary ammonium hydroxide, and an alkanolamine, an optional secondary solvent and less than about 3 wt. % water and/or a dryness coefficient of at least about 1. Methods for the preparation and use of the improved dry stripping solutions are additionally provided.
Claims20
A stripper solution for removing a photoresist from a substrate comprising dimethyl sulfoxide, tetramethylammonium hydroxide, water, and an alkanolamine, said stripper solution having a dryness coefficient of at least 1 wherein said dryness coefficient (DC) is defined by the equation:
- DC
- =
- mass
-
-
- of
-
-
- tetramethylammonium
-
-
-
- hydroxide
- mass
-
-
- of
-
-
- water
-
- .
Dependencies are inferred from the claim text.