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AssigneeNXP B.V.
InventorsRomain Delhougne, Judit Lisoni, Vasile Paraschiv
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A method of producing a multilayer structure is provided, wherein the method comprises forming a phase change material layer onto a substrate, forming a protective layer, forming a further layer on the protective layer, patterning the further layer in an first patterning step, patterning the protective layer and the phase change material layer by a second patterning step. In particular, the first patterning step may be an etching step using chemical etchants. Moreover, electrodes may be formed on the substrate before the phase change material layer is formed, e.g. the electrodes may be formed on one level, e.g. may form a planar structure and may not form a vertically structure.
A method of producing a multilayer structure, the method comprising:
Dependencies are inferred from the claim text.