Thiazole-based semiconductor compound and organic thin film transistor using the same

A method of fabricating an organic thin film transistor, comprising:

• preparing a silicon substrate;
• forming an insulating layer using silicon oxide on the silicon substrate;
• forming an organic semiconductor layer using a compound of Formula 1 on the insulating layer;
• and
• forming source and drain electrodes on the organic semiconductor layer,
• wherein R1, R2, R3 and R4 are independently selected from a group consisting of hydrogen, a C1-C25 alkyl group, a C1-C25 alkoxy group, and a C6-C30 aryl group substituted with C1-C25 alkyl and alkoxy groups, and X and Y are substituents or substituent groups identically or independently selected from a group consisting of
• wherein Z1 is an independently single- or multi-substituted substituent selected from a group consisting of hydrogen, a hydroxyl group, a substituted or unsubstituted methyl group, a carbonyl group, an amino group, a substituted or unsubstituted C1-C30 alkyl amino group, a substituted or unsubstituted C1-C30 aryl amino group, a substituted or unsubstituted heteroaryl amino group, a cyano group, a halogen atom, a substituted or unsubstituted C1-C30 alkyl group, a substituted or unsubstituted C3-C30 cycloalkyl group, a substituted or unsubstituted C1-C30 alkoxy group, a substituted or unsubstituted C6-C30 aryl group, a substituted or unsubstituted C6-C30 aryl alkyl group, a substituted or unsubstituted C2-C30 heteroaryl group, and a substituted or unsubstituted C2-C30 heterocyclic group;
• and R5, R6, R7 and R8 are selected from a group consisting of hydrogen, a C1-C25 ethylene oxide group, a C1-C25 alkyl group, a C1-C25 fluorinated alkyl group, a C1-C25 alkoxy group, a C1-C25 alkylene oxide group, a C1-C25 polydimethylsiloxane group, a C1-C25 alkylene sulfide group, and a C1-C25 ethylene sulfide group.