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US 8,263,321 B2Granted
Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer
AssigneeCheil Industries Inc.
InventorsKyong Ho Yoon, Jong Seob Kim, Dong Seon Uh, Chang Il Oh, Kyung Hee Hyung, Min Soo Kim, Jin Kuk Lee
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Abstract
An antireflective hardmask composition includes an organic solvent, an initiator, and at least one polymer represented by Formulae A, B, or C as set forth in the specification.
Claims10
A bis(phenyl)fluorene-backbone polymer represented by Formula A:
- wherein:
- the fluorene group is unsubstituted or substituted,
- m is at least 1 and is less than about 750,
- n is at least 1 and is less than about 750,
- R1 is
- R2 is oxygen or an alkoxy group having from 1 to about 7 carbons in which the alkoxy oxygen is bonded to the hydrogen H or the group G, and
- G is vinyl or allyl.
4 more elements
An antireflective hardmask composition, comprising:
- an organic solvent;
- an initiator;
- and
- a polymer represented by Formula A;
- wherein:
- in Formula A, the fluorene group is unsubstituted or substituted,
- m is at least 1 and is less than about 750,
- n is at least 1 and is less than about 750,
- R1 is
- R2 is oxygen or an alkoxy group having from 1 to about 7 carbons in which the alkoxy oxygen is bonded to the hydrogen H or the group G, and
- G is vinyl or allyl.
8 more elements
Dependencies are inferred from the claim text.