Display member exposing method and plasma display member manufacturing method
AssigneePanasonic Corporation
InventorsTetsuo Uchida, Yoshiyuki Tsuji, Yuichiro Iguchi, Minori Kamada
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Abstract
A manufacturing method for a plasma display member wherein generation of defects such as interruption and short-circuit of a pattern obtained after exposure and development is suppressed and yield is improved, even when a foreign material is adhered on a photo mask or photo mask is scratched. An exposing method for a display member wherein a display member having a photosensitive layer formed on a base substrate is exposed through a photo mask having a desired pattern. The exposing method for the display member is characterized in that the photo mask and the base substrate are relatively shifted during exposure operation.
Claims6
A method of manufacturing a display member having a pattern of stripes on a base substrate, the method comprising:
- performing an exposure operation by exposing a photosensitive layer formed on the base substrate through a photo mask having a pattern of stripes;
- and
- developing the exposed photosensitive layer to form the pattern of stripes, wherein the photo mask and the base substrate are moved relative to each other along a direction parallel to the direction of the stripes during the exposure operation, and
- a length of the pattern of the photo mask is longer than a coating width of the photosensitive layer.
A method of manufacturing a display member having a pattern of stripes on a base substrate, the method comprising:
- performing plural exposure operations by exposing a photosensitive layer formed on the base substrate through a photo mask having a pattern of stripes;
- and
- developing the exposed photosensitive layer to form the pattern of stripes, wherein the photo mask and the base substrate are moved relative to each other along a direction parallel to the direction of the stripes in the duration between at least two exposure operations, and
- a distance of relative movement between the photo mask and the base substrate is 0.03 to 0.5 mm.
A method of manufacturing a display member having a pattern of periodic lattices on a base substrate, the method comprising:
- performing an exposure operation for forming auxiliary barrier ribs by exposing a photosensitive layer formed on the base substrate through a photo mask having a pattern of stripes for the auxiliary barrier ribs;
- developing the exposed photosensitive layer to form the stripes of the auxiliary barrier ribs;
- performing an exposure operation for forming barrier ribs by exposing a photosensitive layer formed on the base substrate with the pattern of stripes of the auxiliary barrier ribs formed thereon through a photo mask having a pattern of stripes for the barrier ribs which are directed laterally to the pattern of stripes of the auxiliary barrier ribs;
- and
- developing the exposed photosensitive layer to form the pattern of stripes of the barrier ribs, thereby obtaining the pattern of periodic lattices,
- wherein in the exposure operation for forming the auxiliary barrier ribs, the photo mask and the base substrate are moved relative to each other along a direction parallel to the direction of the pattern of stripes for the auxiliary barrier ribs during the exposure operation, and
- a length of the pattern of the photo mask is longer than a coating width of the photosensitive layer,
- wherein in the exposure operation for forming the barrier ribs, the photo mask and the base substrate are moved relative to each other along a direction parallel to the direction of the pattern of stripes for the barrier ribs during the exposure operation, and
- a length of the pattern of the photo mask is longer than a coating width of the photosensitive layer.
A method of manufacturing a display member having a pattern of periodic lattices on a base substrate, the method comprising:
- performing plural exposure operations for forming auxiliary barrier ribs by exposing a photosensitive layer formed on the base substrate through a photo mask having a pattern of stripes for the auxiliary barrier ribs;
- developing the exposed photosensitive layer to form the stripes of the auxiliary barrier ribs;
- performing plural exposure operations for forming barrier ribs by exposing a photosensitive layer formed on the base substrate with the pattern of stripes of the auxiliary barrier ribs formed thereon through a photo mask having a pattern of stripes for the barrier ribs which are directed laterally to the pattern of stripes of the auxiliary barrier ribs;
- and
- developing the exposed photosensitive layer to form the pattern of stripes of the barrier ribs, thereby obtaining the pattern of periodic lattices,
- wherein in each of the exposure operations,
- the photo mask and the base substrate are moved relatively to each other along a direction parallel to the direction of the stripes in the duration between at least two exposure operations, and
- a distance of relative movement between the photo mask and the base substrate is 0.03 to 0.5 mm.
Dependencies are inferred from the claim text.