Methods for fabricating isolated micro-and nano-structures using soft or imprint lithography

A method for forming a plurality of substantially uniform nanoparticles, the method comprising:

• (a) providing a patterned template and a first substrate, wherein at least one of said patterned template or said substrate has a non-wetting surface, and wherein the patterned template comprises a patterned template surface having a plurality of recessed areas formed therein;
• (b) disposing a volume of liquid material in or on at least one of:
• (i) the patterned template surface;
• (ii) the plurality of recessed areas;
• and
• (iii) said first substrate;
• and
• (c) forming said plurality of substantially uniform nanoparticles by:
• contacting the patterned template surface with the first substrate and treating the liquid material to form nanoparticles in the recessed areas of the patterned template wherein the nanoparticles are essentially free of a scum layer;
• (d) removing the first substrate from the patterned template;
• and
• (e) releasing the nanoparticles from the patterned template by applying the patterned template to a second substrate, wherein the second substrate has an affinity for the nanoparticles that is greater than the affinity of the nanoparticles for the patterned template, and wherein each of said nanoparticles substantially mimics the recessed areas.