Substrate processing apparatus and substrate transferring method

A substrate processing apparatus, comprising:

• a substrate holding and rotating mechanism, having a spin base arranged to rotate around an axis of rotation, for holding and rotating a substrate;
• at least two positioning members provided on the substrate holding and rotating mechanism for positioning the substrate at a predetermined substrate holding position, the positioning members being fixed to the spin base such that the positioning members are unmovable relative to the spin base, with a first distance between the positioning members;
• a substrate transfer mechanism for transferring the substrate to the substrate holding and rotating mechanism;
• a pressing unit disposed on the substrate transfer mechanism for pressing the substrate toward the positioning members in a pressing direction;
• and
• a control unit programmed to execute a step of pressing a substrate to the positioning members by use of the pressing unit disposed on the substrate transfer mechanism, wherein
• the substrate transfer mechanism includes a substrate holding hand for holding the substrate,
• the substrate holding hand includes a substrate contact portion provided at a base end of the substrate holding hand and arranged to come in contact with an end face of the substrate, and a pair of support members provided at a tip end of the substrate holding hand with a second distance between said support members longer than the first distance,
• the pressing unit includes a substrate-contact-portion moving mechanism for moving the substrate contact portion toward the positioning members, and
• the at least two positioning members are disposed between the pair of support members when viewed in the pressing direction.