Double rie damascene process for nose length control

A method of forming a write pole for a magnetic recording head, the method comprising:

• providing a wafer comprising an insulation layer, the insulation layer having an insulator material;
• forming a first photomask over the insulation layer, the first photomask providing a first opening over one of at least a yoke region and at least a pole tip region of the write pole to be formed;
• performing a first etch process on the insulation layer via the first opening, the first etch process removing the insulator material from a corresponding one of at least the yoke region and at least the pole tip region;
• forming a second photomask over the insulation layer, the second photomask providing a second opening over a different one of at least the yoke region and at least the pole tip region of the write pole to be formed than the first opening;
• performing a second etch process on the insulation layer via the second opening, the second etch process removing the insulator material from a corresponding one of at least part of the yoke region and at least part of the pole tip region;
• and
• depositing a pole material across the wafer, whereby the yoke region and the pole tip region of the write pole are formed, the pole tip region adjoining the yoke region.