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US 8,253,099 B2Granted
Methods and devices for high throughput crystal structure analysis by electron diffraction
AssigneeNanomegas Sprl
InventorsStavros Nicolopoulos, Daniel Bultreys, Edgard Rauch
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Abstract
A method and device for electron diffraction tomography of a crystal sample, which employs scanning of the electron beam over a plurality of discrete locations of the sample, in combination with a beam scanning protocol as the beam converges at every discrete location (42, 43) of the sample (38) to obtain a series of electron diffraction patterns, use of template matching to determine crystal orientations and thickness maps to obtain a common intensity scaling factor.
Claims13
A method for electron diffraction tomography of a crystal sample, comprising:
- a) providing a sample comprising a plurality of said crystals in random orientations;
- b) obtaining an electron diffraction, ED pattern from each of a plurality of discrete locations within an area of the sample, wherein an electron beam used to obtain the ED patterns is scanned across the sample, in combination with a beam scanning protocol as the beam converges at every discrete location of the sample;
- c) determining different crystal orientations in the sample using template matching applied to the individual ED patterns obtained in b);
- d) determining, from relative thickness maps obtained as virtual bright field, STEM bright field, HAADF or zero loss EELS thickness maps, the relative crystal thicknesses at the discrete locations wherein the ED pattern were obtained;
- e) determining a common intensity scaling factor from the relative thickness determined in d), and normalizing the intensities of individual ED patterns from discrete locations;
- and
- f) calculating the atomic crystal structure of the randomly oriented crystals from the three dimensional set of normalized ED patterns and orientation information.
4 more elements
Dependencies are inferred from the claim text.