Annealing apparatus
AssigneeTokyo Electron Limited
InventorsShigeru Kasai, Hiroyuki Miyashita, Masatake Yoneda, Tomohiro Suzuki, Sumi Tanaka, Masamichi Nomura, Miwa Shimizu
Life of this patent
Estimating the term…
Loading patent…
AssigneeTokyo Electron Limited
InventorsShigeru Kasai, Hiroyuki Miyashita, Masatake Yoneda, Tomohiro Suzuki, Sumi Tanaka, Masamichi Nomura, Miwa Shimizu
Estimating the term…
Provided is an annealing apparatus, which is free from a problem of reduced light energy efficiency resulted by the reduction of light emission amount due to a heat generation and capable of maintaining stable performance. The apparatus includes: a processing chamber 1 for accommodating a wafer W; heating sources 17a and 17b including LEDs 33 and facing the surface of the wafer W to irradiate light on the wafer W; light-transmitting members 18a and 18b arranged in alignment with the heating sources 17a and 17b to transmit the light emitted from the LEDs 33; cooling members 4a and 4b supporting the light-transmitting members 18a and 18b at opposite side to the processing chamber 1 to make direct contact with the heating sources 17a and 17b and made of a material of high thermal conductivity; and a cooling mechanism for cooling the cooling members 4a and 4b with a coolant.
An annealing apparatus comprising:
An annealing apparatus comprising:
Dependencies are inferred from the claim text.