Method of manufacturing a hysteretic MEMS two-dimensional thermal device
AssigneeInnovative Micro Technology
InventorPaul J. Rubel
Life of this patent
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Abstract
A MEMS hysteretic thermal device may be formed having two passive beam segments driven by a current-carrying loop coupled to the surface of a substrate. The first beam segment is configured to move in a direction having a component perpendicular to the substrate surface, whereas the second beam segment is configured to move in a direction having a component parallel to the substrate surface. By providing this two-dimensional motion, a single MEMS hysteretic thermal device may by used to close a switch having at least one stationary contact affixed to the substrate surface.
Claims19
A method of manufacturing a hysteretic micromechanical device on a surface of a substrate comprising:
- forming a first beam segment configured to move in a direction having a component perpendicular to the substrate surface;
- forming a second beam segment configured to move in a direction having a component parallel to the substrate surface;
- forming a flexure joining the first beam segment to the second beam segment, wherein a distal end of the second beam segment is driven in a first trajectory during activation and a second trajectory during relaxation of the first beam segment and the second beam segment.
A method of manufacturing a hysteretic micromechanical device on a surface of a substrate comprising:
- forming a first beam segment coupled to the substrate at an anchor point at a proximal end and configured to move in a direction having a component perpendicular to the substrate surface;
- forming a second beam segment coupled to a contact a distal end, and configured to move in a direction having a component parallel to the substrate surface;
- forming a flexure joining the first beam segment at a distal end and a the second beam segment at a proximal end, wherein the first beam segment and the second beam segment are driven in a first trajectory during activation and a second trajectory during relaxation
- plating a contact material on a sacrificial layer;
- forming the second beam segment over the sacrificial layer such that a distal end of the second beam segment is coupled to the contact material;
- forming a stationary contact on the substrate surface by plating at least one of gold, palladium, a gold-cobalt alloy, ruthenium, platinum, a gold-platinum alloy, and gold-nickel alloy over the substrate surface, wherein the stationary contact interacts with the contact material on the distal end of the second beam segment to form terminals of an electrical switch.
An apparatus for forming a hysteretic micromechanical device on a surface of a substrate, comprising:
- means for forming a first beam segment configured to move in a direction having a component perpendicular to the substrate surface;
- means for forming a second beam segment configured to move in a direction having a component parallel to the substrate surface;
- means for forming a flexure joining the first beam segment to the second beam segment, wherein a distal end of the second beam segment is driven in a first trajectory during activation and a second trajectory during relaxation of the first beam segment and the second beam segment.
Dependencies are inferred from the claim text.