Off-axis ion milling device for manufacture of magnetic recording media and method for using the same
AssigneeHitachi Global Storage Technologies Netherlands B.V.
InventorsThomas Robert Albrecht, Jeffrey S. Lille
Life of this patent
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Abstract
A tool for patterning a disk such as a magnetic media disk for use in a disk drive system. The tool includes a chamber and a first and second series of magnets, each evenly spaced about the chamber wall. An ion beam source at an end of the chamber emits an ion beam toward the disk which is held within the chamber. The first series of magnets deflect the ion beam away from center and toward the chamber wall. The second ion beam source deflects the ion beam back toward the center so that the ion beam can strike the disk at an angle. In addition, to bending the ion beam, the magnets also rotate the bent ion beam so the movement of the ion beam revolves within the chamber.
Claims22
A tool for treating a substrate, comprising:
- a chamber having an end and a chamber wall;
- a mechanism for holding a sample within the chamber;
- an ion source located at the end of the chamber;
- a first series of magnets spaced about the chamber wall at a first location;
- a second series of magnets spaced about the chamber wall at a second location, the first location being closer to the ion source than the second location;
- and
- circuitry connected with the first and second magnets to control the activation of first and second series of magnets so that the first series of magnets deflects the ion beam outward toward the chamber wall, and the second series of magnets deflects the ion beam inward away from the chamber wall thereby curving the ion beam path that terminates at the sample, the circuitry also being configured to control activation of the magnets within each of the first and second series of magnets to cause the curved ion beam to rotate about an axis that is perpendicular to the sample, such that the ion beam impinges the sample with a rotating angle.
A tool for patterning a substrate, the tool comprising:
- a chamber having first and second ends;
- a mechanism for holding a disk within the chamber, such that a first surface of the disk is exposed toward the first end of the chamber and a second surface of the disk is exposed toward the second end of the chamber;
- a first series of magnets spaced about the chamber and located between the disk and the first end of the chamber;
- a second series of magnets spaced about the chamber and located between the disk and the first series of magnets;
- a third series of magnets spaced about the chamber and located between the disk and the second end of the chamber;
- a fourth series of magnets spaced about the chamber and located between the disk and the third series of magnets;
- a first ion beam source located at the first end of the chamber;
- and
- a second ion beam source located at the second end of the chamber;
- wherein the first and second series of magnets are located between the first ion source and the disk, and the third and fourth series of magnets are located between the second ion source and the disk, and ions from the ion sources impinge upon the substrate.
A tool for patterning a substrate, comprising:
- a chamber having an end and a chamber wall;
- a mechanism for holding a magnetic disk within the chamber;
- an ion source located at the end of the chamber;
- a first set of magnets spaced about the chamber wall at a first location;
- a second set of magnets spaced about the chamber wall at a second location, the first location being closer to the ion source than the second location;
- and
- a structure connected with first and second sets of magnets, the structure being operable to cause the magnets to revolve about the chamber.
Dependencies are inferred from the claim text.