Cleaning method and substrate processing apparatus
AssigneeTokyo Electron Limited
InventorYusuke Nakagawa
Life of this patent
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Abstract
A cleaning method that can prevent abnormal wear of an O-ring. A cleaning gas containing at least oxygen gas is supplied to the interior of a chamber in which a substrate is accommodated, and radio-frequency voltage is applied to the interior of the chamber to produce oxygen radicals from the cleaning gas. When the amount of deposit produced in the chamber in plasma processing is larger than a predetermined amount, the amount of fluorine radicals in the chamber is increased, and when the amount of the deposit is smaller than the predetermined amount, the amount of fluorine radicals in the chamber is decreased.
Claims11
A cleaning method for a substrate processing apparatus that has an accommodating chamber in which a substrate is accommodated, and a sealing member made of fluorine-based rubber that seals an interior of the accommodating chamber from outside, and that carries out plasma processing on the substrate using plasma produced from a fluorocarbon-based gas in the accommodating chamber, comprising:
- a first plasma processing step of carrying out the plasma processing on at least one substrate;
- a measuring step of measuring an amount of deposit produced in the accommodating chamber in said first plasma processing step;
- a determination step of determining whether the measured amount of the deposit is larger than a predetermined amount;
- a second plasma processing step of carrying out the plasma processing subsequent to said determination step;
- a cleaning step of supplying a cleaning gas containing at least oxygen gas to the interior of the accommodating chamber and applying radio-frequency voltage to the interior of the accommodating chamber to produce oxygen radicals from the cleaning gas,
- wherein when in said determination step the amount of the deposit is determined to be larger than the predetermined amount, the amount of the deposit in the accommodating chamber is increased in said second plasma processing step, and when in said determination step the amount of the deposit in the accommodating chamber is determined to be smaller than the predetermined amount, the amount of the deposit is decreased in said second plasma processing step.
Dependencies are inferred from the claim text.