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US 8,213,015 B2Granted
Integrated flow cell with semiconductor oxide tubing
AssigneeAgilent Technologies, Inc.
InventorsKarsten Kraizcek, Beno Mueller, Timothy Beerling
Life of this patent
Estimating the term…
Abstract
An integrated flow cell, the flow cell comprising a semiconductor substrate, and a fluidic conduit having an at least partially transparent semiconductor oxide tubing, wherein the semiconductor oxide tubing is formed with the semiconductor substrate.
Claims19
An integrated flow cell, comprising:
- a semiconductor substrate;
- a fluidic conduit having an at least partially transparent semiconductor oxide tubing formed with the semiconductor substrate and comprising a semiconductor oxide to air transition providing total reflection along a measurement length within the fluidic conduit;
- at least one window element coupling UV-Visible electromagnetic radiation into or out of the fluidic conduit;
- an inlet for supplying a fluidic sample to the fluidic conduit;
- and
- an outlet for draining the fluidic sample from the fluidic conduit.
3 more elements
A method of manufacturing an integrated flow cell, the method comprising:
- providing a semiconductor substrate;
- forming a fluidic conduit having an at least partially transparent semiconductor oxide tubing, wherein the semiconductor oxide tubing is formed with the semiconductor substrate and is formed with a semiconductor oxide to air transition providing total reflection along a measurement length within the fluidic conduit;
- forming at least one window element coupling UV-Visible electromagnetic radiation into or out of the fluidic conduit;
- forming an inlet for supplying a fluidic sample to the fluidic conduit;
- and
- forming an outlet for draining the fluidic sample from the fluidic conduit.
3 more elements
Dependencies are inferred from the claim text.