Well-defined donor-acceptor rod-coil diblock copolymer based on P3HT containing C60
AssigneeThe Regents of the University of California
InventorsChangduk Yang, Fred Wudl
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Abstract
A method for the synthesis of well-defined rod-coil block copolymers consisting of P3HT donor and C60 acceptor chromophores (P3HT-b-P(SxAy)-C60) in a molecular architecture is reported for use in bulk-heterojunction (BHJ) solar cells. In thin films of the resulting block copolymer, reproducible self-assembly into well-defined “nanofibrils” is observed. This is the first example of a block copolymer containing a C60 derivative that shows exclusively a nanofibrilar structure. A substantial improvement in device performance is achieved when the block copolymer is used as a “surfactant” for controlling the interface morphology of the P3HT:PCBM donor-acceptor phase domains within the composite.
Claims17
An organic photovoltaic device comprising a layer comprising P3HT (poly(3-hexyl)thiophene), PCBM (phenyl C61-butyric acid methyl ester), and P3HT-b-P(SxAy)-C60, wherein S is styrene and A is acrylate, x is the mol ratio of S and y is the mol ratio of A wherein said P3HT-b-P(SxAy)-C60 interfaces between the P3HT and PCBM;
- thereby leading to improve performance of the photovoltaic device.
A composition comprising P3HT (poly(3-hexyl)thiophene), PCBM (phenyl C61-butyric acid methyl ester), and P3HT-b-P(SxAy)-C80, wherein S is styrene and A is acrylate, x is the mol ratio of S and y is the mol ratio of A.
A diblock copolymer comprising the formula of P3HT-b-P(SxAy)-C60, wherein S is styrene and A is acrylate, x is the mol ratio of S in the copolymer and y is the mol ratio of A in the copolymer, whereby the diblock is sufficiently soluble to be cast as a thin film.
A method for the synthesis of P3HT-b-P(SxAy)-C60 diblock comprising:
- undergoing a living polymerization reaction
- performing cycloaddition reactions;
- and performing the following reactions:
A method of using a diblock compound to interface between P3HT (poly(3-hexyl)thiophene) and PCBM (phenyl C61-butyric acid methyl ester) layers, comprising mixing said diblock with said P3HT and PCBM compounds, wherein said diblock comprises the formula of P3HT-b-P(SxAy)-C60 wherein S is styrene and A is acrylate, x is the mol ratio of S and y is the mol ratio of A.
A diblock copolymer comprising the formula of P3HT-b-P(SxAy)-C60, wherein S is styrene and A is acrylate, x is the moi ratio of S in the copolymer and y is the mol ratio of A in the copolymer, whereby the diblock is sufficiently soluble to be cast as a thin film, wherein % mol of P3HT (poly(3-hexyl)thiophene), % mol of PS, % mol of PA, and % wt of C60 is 10-20, 50-80, 10-40, and 30-50, respectively.
A diblock copolymer comprising the formula of P3HT-b-P(SxAy)-C60, wherein S is styrene and A is acrylate, x is the mol ratio of S in the copolymer and y is the mol ratio of A in the copolymer, whereby the diblock is sufficiently soluble to be cast as a thin film, wherein x is 80 and y is 20.
Dependencies are inferred from the claim text.