Wet developable bottom antireflective coating composition and method for use thereof

A method of forming and transferring a relief image by photolithography, said method comprising:

• applying, to a substrate, a layer of an antireflective coating composition to form an antireflective layer, said antireflective coating composition is developable in an aqueous alkaline developer and comprises a polymer having one of the following structures:
• wherein x, y, and z are the same or different, and are independently an integer of 5-500,
• applying a layer of a positive photoresist composition over the antireflective layer to form a photoresist layer;
• pattern-wise exposing the photoresist layer and the antireflective layer to an imaging radiation to form a latent image;
• contacting the photoresist layer and the antireflective layer with the aqueous alkaline developer, wherein the exposed portions of the photoresist layer and the exposed portions of the antireflective layer are removed to form a patterned photoresist layer and a patterned antireflective layer having a relief image pattern therein;
• and
• transferring the relief image pattern in the patterned photoresist layer and the patterned antireflective layer to the substrate.