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AssigneesKomatsu Ltd., Gigaphoton Inc.
InventorsMasato Moriya, Osamu Wakabayashi, Georg Soumagne
Estimating the term…
The EUV light source device eliminates radiation other than EUV radiation from the light which it emits, and supplies only the EUV radiation to an exposure device. A composite layer consisting of a plurality of Mo/Si pair layers is provided upon the front surface of an EUV collector mirror, and blazed grooves are formed in this composite layer. Radiation emitted from a plasma is incident upon this EUV collector mirror, and is reflected or diffracted. The reflected EUV radiation (including diffracted EUV) proceeds towards an intermediate focal point IF. The radiation of other wavelengths proceeds towards some position other than this focal point IF, because its reflection angle or diffraction angle is different. A SPF shield having an aperture portion is provided at the focal point IF. Accordingly, only the EUV radiation passes through the aperture portion and is supplied to the exposure device, while the other radiation is intercepted by the shield.
An EUV (Extreme Ultraviolet) collector mirror for an EUV light source, the EUV light source being configured for irradiating a target with laser light from a driver laser to turn the target into plasma, the EUV collector mirror comprising a multilayered reflecting surface with grooves and being configured for collecting EUV light from the plasma to a focal spot, the grooves being arranged in a concentric fashion, wherein the grooves are configured for diffracting at least light at a wavelength which is the same as that of the laser light from the driver laser.
An EUV light source for generating an EUV light for an exposure device, the EUV light source being configured for irradiating a target with laser light from a driver laser to turn the target into plasma from which the EUV light is emitted, the EUV light source comprising:
An EUV (Extreme Ultraviolet) collector mirror for an EUV light source, the EUV light source being configured for irradiating a target with laser light from a driver laser to turn the target into plasma, the EUV collector mirror comprising a multilayered reflecting surface with grooves and being configured for collecting EUV light from the plasma to a focal spot, the grooves being arranged in a concentric fashion, wherein
Dependencies are inferred from the claim text.