Positive resist composition, method of forming resist pattern, and polymeric compound
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsTakahiro Dazai, Tomoyuki Hirano, Daiju Shiono, Tasuku Matsumiya
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Abstract
A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1) (R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof) and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group.
Claims14
A positive resist composition comprising a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure,
- said base component (A) comprising a polymeric compound (A1) comprised of a structural unit (a0) represented by general formula (a0-1) shown below and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group:
- wherein R1 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group;
- R2 represents a divalent linking group;
- and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof.
A polymeric compound comprising a structural unit (a0) represented by general formula (a0-1) shown below and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group:
- wherein R1 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group;
- R2 represents a divalent linking group;
- and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof.
Dependencies are inferred from the claim text.