Method of cutting an object to be processed
AssigneeHamamatsu Photonics K. K.
InventorsFumitsugu Fukuyo, Kenshi Fukumitsu
Life of this patent
Estimating the term…
Loading patent…
AssigneeHamamatsu Photonics K. K.
InventorsFumitsugu Fukuyo, Kenshi Fukumitsu
Estimating the term…
A method of cutting an object which can accurately cut the object is provided. An object to be processed 1 such as a silicon wafer is irradiated with laser light L while a light-converging point P is positioned therewithin, so as to form a modified region 7 due to multiphoton absorption within the object 1, and cause the modified region 7 to form a starting point region for cutting 8 shifted from the center line CL of the thickness of the object 1 toward the front face 3 of the object 1 along a line along which the object should be cut. Subsequently, the object 1 is pressed from the rear face 21 side thereof. This can generate a fracture from the starting point region for cutting 8 acting as a start point, thereby accurately cutting the object 1 along the line along which the object should be cut.
A method of cutting an object to be processed, the method comprising:
A method of manufacturing a semiconductor device formed using a method of cutting an object to be processed, the manufacturing method comprising:
Dependencies are inferred from the claim text.