Method for producing electron-emitting device and method for producing image display apparatus including the same
AssigneeCanon Kabushiki Kaisha
InventorsKyota Nozu, Kenichi Iwata, Tamaki Kobayashi, Shin Kitamura, Akira Shimazu
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Abstract
A method for producing an electron-emitting device includes forming a first conductive film on a side surface of an insulation layer including the side surface and a top surface connected to the side surface; forming a second conductive film from the top surface to the side surface and on the first conductive film; and etching the second electrically conductive film.
Claims20
A method for producing an electron-emitting device comprising:
- providing a substrate;
- forming a first conductive film on a side surface of an insulation layer including the side surface and a top surface connected to the side surface;
- forming a second conductive film from the top surface to the side surface and on the first conductive film;
- and
- connected to the side surface on the substrate;
- etching the second conductive film,
- wherein the second conductive film is formed such that a portion of the second conductive film on the top surface has a higher film density than a portion of the second conductive film on the side surface to provide the portion of the second conductive film having a high film density and the portion of the second conductive film having a low film density, and
- the portion of the second conductive film having the low film density is etched more than the portion of the second conductive film having the high film density.
A method for producing image display apparatus including a plurality of electron-emitting devices, and a light-emitting member to which electrons emitted from the plurality of electron-emitting devices are radiated, the method comprising;
- producing a plurality of electron-emitting devices comprising:
- providing a substrate;
- forming a first conductive film on a side surface of an insulation layer including the side surface and a top surface connected to the side surface on the substrate;
- forming a second conductive film from the top surface to the side surface and on the first conductive film;
- and
- etching the second conductive film,
- wherein the second conductive film is formed such that a portion of the second conductive film on the top surface has a higher film density than a portion of the second conductive film having on the side surface to provide the portion of the second conductive film having a high film density and the portion of the second conductive film having a low film density, and
- the portion of the second conductive film having the low film density is etched more than the portion of the second conductive film having the high density;
- and
- providing a face plate which a light-emitting member facing to the plurality of electron-emitting devices.
Dependencies are inferred from the claim text.