Method for manufacturing electrophotographic photosensitive member

A method for manufacturing an electrophotographic photosensitive member, which mounts a conductive substrate in a reaction vessel that can be evacuated, supplies a source gas into the reaction vessel and introduces a high-frequency power to form a deposited film on the conductive substrate, comprising in the following order:

• forming a photoconductive layer formed from an amorphous material containing silicon atoms on the conductive substrate;
• forming a first surface layer formed from an amorphous material containing silicon atoms and carbon atoms;
• and
• forming a second surface layer formed from an amorphous material containing silicon atoms and carbon atoms as a layer in a top surface side of the electrophotographic photosensitive member, wherein
• when flow rates of CH4 and SiH4 to be supplied into the reaction vessel in forming the first surface layer are defined as C1 and S1 and a high-frequency power to be introduced into the reaction vessel is defined as P1, and when flow rates of CH4 and SiH4 to be supplied into the reaction vessel in forming the second surface layer are defined as C2 and S2 and a high-frequency power to be introduced into the reaction vessel is defined as P2,
• the first surface layer and the second surface layer are formed while supplying the source gas into the reaction vessel so that C2/S2 is 3 or more and 25 or less and C1/S1 is C2/S2 or more and 60 or less, and
• while adjusting the high-frequency power so that P2>P1 can be satisfied, and so that both a ratio of the number of atoms of the carbon atoms with respect to the sum of the number of atoms of the silicon atoms and the carbon atoms contained in the first surface layer and the ratio of the number of atoms of the carbon atoms with respect to the sum of the number of atoms of the silicon atoms and the carbon atoms contained in the second surface layer can be 0.50 or more and 0.80 or less.