Method for the formation of doped boron
AssigneeSpecialty Materials, Inc.
InventorRaymond J. Suplinskas
Life of this patent
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Abstract
A chemically doped boron coating is applied by chemical vapor deposition to a silicon carbide fiber and the coated fiber then is exposed to magnesium vapor to convert the doped boron to doped magnesium diboride and a resultant superconductor.
Claims29
A method for producing doped boron deposited as a doped boron coating on a substrate, said method comprising the steps of:
- introducing a boron-containing vapor into a reaction vessel;
- introducing a dopant vapor into the vessel to provide a mixture of the dopant vapor and the boron-containing vapor;
- and, heating the mixture by providing a heated substrate surface in the reaction vessel that contacts the mixture of the dopant vapor and the boron-containing vapor to produce a doped boron coating on the substrate.
A method for producing doped boron comprising the steps of:
- (a) introducing a boron-containing vapor into a reaction vessel by metering a flow of hydrogen and metering a flow of boron trichloride vapor through the reaction vessel;
- (b) introducing a dopant vapor into the reaction vessel by passing at least a portion of the flow of hydrogen through a bubbler containing liquid titanium tetrachloride;
- mixing the hydrogen/titanium tetrachloride mixture emerging from the bubbler with the flow of boron trichloride going to the reaction vessel to form a boron-containing vapor/dopant-containing vapor mixture;
- and passing the boron-containing vapor/dopant-containing vapor mixture through the reaction vessel;
- (c) heating the boron-containing vapor/dopant-containing vapor mixture in the reaction vessel to produce doped boron;
- and,
- (d) depositing the doped boron as a coating on a substrate.
A method for producing doped boron comprising the steps of:
- (a) introducing a boron-containing vapor into a reaction vessel by metering a flow of hydrogen and metering a flow of boron trichloride vapor through the reaction vessel;
- (b) introducing a dopant vapor into the reaction vessel by passing at least a portion of the flow of hydrogen through a bubbler containing liquid methyltrichlorosilane;
- mixing the hydrogen/methyltrichlorosilane mixture emerging from the bubbler with the flow of boron trichloride going to the reaction vessel to form in a boron-containing vapor/dopant-containing vapor mixture;
- and passing the boron-containing vapor/dopant-containing vapor mixture through the reaction vessel;
- and,
- (c) heating the boron-containing vapor/dopant-containing vapor mixture in the reaction vessel to produce doped boron.
A method for producing doped boron comprising the steps of:
- (a) introducing a boron-containing vapor into a reaction vessel by metering a flow of hydrogen and metering a flow of boron trichloride vapor through the reaction vessel;
- (b) introducing a dopant vapor into the reaction vessel by metering a flow of methane gas into the reaction vessel together with the hydrogen and the boron trichloride;
- and,
- (c) heating the mixture of hydrogen, boron trichloride and methane in the reaction vessel to produce doped boron.
A method for producing doped boron comprising the steps of:
- introducing a boron-containing vapor into a reaction vessel;
- introducing a dopant vapor into the reaction vessel to provide a mixture of the dopant vapor and the boron-containing vapor;
- and, heating the mixture to produce doped boron;
- further wherein the dopant vapor is a hydrogen and methyltrichlorosilane vapor mixture.
A method for producing doped boron comprising the steps of introducing a boron-containing vapor into a reaction vessel;
- introducing a dopant vapor into the reaction vessel to provide a mixture of the dopant vapor and the boron-containing vapor;
- and, heating the mixture to produce doped boron;
- further wherein the dopant vapor is methane gas.
A method for producing doped boron comprising the steps of:
- introducing a boron-containing vapor into a reaction vessel;
- introducing a dopant vapor into the reaction vessel to provide a mixture of the dopant vapor and the boron-containing vapor;
- and, heating the mixture to produce doped boron;
- said method additionally comprising the step of depositing the doped boron as a coating on a substrate.
Dependencies are inferred from the claim text.