Method and apparatus for forming protective layer
AssigneePanasonic Corporation
InventorsKazuo Uetani, Kaname Mizokami, Yoshinao Ooe, Akira Shiokawa, Hiroyuki Kado
Life of this patent
Estimating the term…
Loading patent…
AssigneePanasonic Corporation
InventorsKazuo Uetani, Kaname Mizokami, Yoshinao Ooe, Akira Shiokawa, Hiroyuki Kado
Estimating the term…
An apparatus for forming a protective layer of magnesium oxide on a front glass substrate (11) in an evaporation chamber (201) includes the following: oxygen outlet openings (222) for introducing oxygen into the evaporation chamber (201); water vapor outlet openings (210) for introducing water vapor into the evaporation chamber (201) from the downstream side in the transfer direction of the front glass substrate (11); a mass analyzer (224) for measuring the ionic strength of hydrogen and the ionic strength of oxygen in the evaporation chamber (201); and mass flow controllers (215) and (221) for controlling the introduction amount of the water vapor and the introduction amount of the oxygen, respectively, by the ionic strengths measured by the mass analyzer (224).
A method for forming a protective layer while a substrate is being transferred in a film-forming chamber, the method comprising:
Dependencies are inferred from the claim text.