Loading patent…
AssigneeL'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude
InventorsMasahiro Kimoto, Terumasa Koura, Yukio Fukuda, Masaki Narazaki, Taiji Hashimoto, Toru Sakai, Kazuo Yokogi
Estimating the term…
To provide a simple highly-pure Xe retrieval method and device with high retrieval efficiency by functionally removing such elements as water, CO2 and FCs from waste gases from semiconductor production processes, such as the plasma etching, that contain low-concentration Xe. For samples containing xenon and fluorocarbon, this invention is characterized by having at least first adsorption means (A1) filled with synthetic zeolite with pore size of 4A or smaller and aluminum oxide, arranged serially, gas separation means (A2) composed of silicone or polyethylene hollow fiber gas separation membrane modules 4, second adsorption means (A3) filled with either activated carbon, synthetic zeolite with pore size of 5A or larger, molecular sieving carbon with pore size of 5A or larger, or a combination of these, and reaction means (A4) filled with calcium compounds as reactant.
A method to retrieve xenon of purity over 99% from samples that contain approximately 0.1˜1 vol % xenon and at least fluorocarbon, characterized by processing operations including at least the following processing steps of said samples:
A device that retrieves xenon of purity over 99% from samples that contain approximately 0.1˜1% xenon and at least fluorocarbon, and characterized by having:
Dependencies are inferred from the claim text.