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US 8,146,025 B2Granted
Method for correcting layout pattern using rule checking rectangle
AssigneeUnited Microelectronics Corp.
InventorsYu-Shiang Yang, Chun-Hsien Huang
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Abstract
A method for correcting layout pattern is disclosed. The method includes the steps of: providing a layout pattern having at least one segment; forming a rule-checking rectangle from the segment, wherein the rule-checking rectangle comprises at least one square; verifying whether the square of the rule-checking rectangle overlaps other layout pattern; removing the portion of other layout pattern overlapped by the square to obtain a corrected layout pattern; and outputting the corrected layout pattern to a mask.
Claims5
A method for correcting layout pattern, comprising:
- providing a layout pattern having at least one segment;
- inputting the layout pattern into a computer system;
- forming a rule-checking rectangle from the segment, wherein the rule-checking rectangle comprises a rectangle and two squares, and the length of the rectangle is equal to the length of the segment;
- verifying whether one of the squares of the rule-checking rectangle overlaps other layout pattern;
- removing the portion of other layout pattern overlapped by the one of the squares to obtain a corrected layout pattern;
- and
- outputting the corrected layout pattern to a mask.
4 more elements
Dependencies are inferred from the claim text.