Method for measuring polarization characteristics and measurement apparatus

A measurement apparatus for measuring polarization characteristics of light on an image plane where an image of a mask pattern is projected, the measurement apparatus comprising:

• a displacement unit configured to displace a first slit and a second slit having a width less than or equal to the wavelength of a light source on the image plane;
• a light receiving unit configured to receive light passing through the first slit and the second slit;
• and
• a calculation unit configured to calculate the polarization characteristics using information obtained from the light receiving unit,
• wherein when the mask is illuminated with the light from the light source and an image of the mask pattern is projected onto the image plane, the measurement apparatus acquires a first light intensity distribution with respect to a direction of displacement of the first slit by receiving light passing through the first slit by the light receiving unit while the displacement unit is displacing the first slit on the image plane, and acquires a second light intensity distribution with respect to a direction of displacement of the second slit by receiving light passing through the second slit by the light receiving unit while the displacement unit is displacing the second slit on the image plane, and
• wherein the calculation unit determines respectively positions where a maximum value and a minimum value of the first light intensity distribution are obtained, and calculates an index value using the light intensities in the second light intensity distribution at positions respectively corresponding to the determined positions, and acquires the polarization characteristics corresponding to the calculated index value by using information expressing a relationship between the index value and the polarization characteristics.

A method for manufacturing a device, the method comprising:

• exposing a substrate using an exposure apparatus;
• developing the exposed substrate;
• and
• producing the device from the developed substrate,
• wherein the exposure apparatus includes an illumination optical system configured to illuminate a mask using light illuminated from a light source, a projection optical system configured to project an image of the illuminated mask pattern image onto the substrate, and a measurement apparatus configured to measure polarization characteristics of light on an image plane where the image of the mask pattern is projected,
• wherein the measuring apparatus includes a displacement unit configured to displace a first slit and a second slit each having a width less than or equal to the wavelength of the light source on the image plane, a light receiving unit configured to receive light passing through the first slit and the second slit, and a calculation unit configured to calculate polarization characteristics using information obtained from the light receiving unit,
• wherein when the mask is illuminated with the light from the light source and an image of the mask pattern is projected onto the image plane, the measurement apparatus acquires a first light intensity distribution with respect to a direction of displacement of the first slit by receiving light passing through the first slit by the light receiving unit while the displacement unit is displacing the first slit on the image plane, and acquires a second light intensity distribution with respect to a direction of displacement of the second slit by receiving light passing through the second slit by the light receiving unit while the displacement unit is displacing the second slit on the image plane, and
• wherein the calculation unit determines respectively positions where a maximum value and a minimum value of the first light intensity distribution are obtained, calculates an index value using the light intensities in the second light intensity distribution at positions respectively corresponding to the determined positions, and acquires the polarization characteristics corresponding to the calculated index value by using information expressing a relationship between the index value and the polarization characteristics.