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US 8,139,199 B2Granted
Exposure method, exposure apparatus, light converging pattern formation member, mask, and device manufacturing method
AssigneeNikon Corporation
InventorMichio Noboru
Life of this patent
Estimating the term…
Abstract
An exposure method includes a first exposure step of irradiating a mask, which is arranged near a plate, with exposure light and exposing a predetermined pattern formed on the mask onto a plate; and a second exposure step of irradiating a light converging pattern formation member, which is arranged near the plate and includes a plurality of light converging portions, with exposure light and exposing a light converging pattern having a predetermined shape onto the plate. At least part of the predetermined pattern exposed onto the plate in the first exposure step and at least part of the light converging pattern formed on the plate in the second exposure step overlap each other.
Claims56
An exposure method comprising:
- a first exposure step of irradiating a mask, which is arranged near a plate, with exposure light and exposing a predetermined pattern formed on the mask onto the plate;
- and
- a second exposure step of irradiating a light converging pattern formation member including a plurality of light converging portions that are arranged near the plate and are located at predetermined distances from the mask in a direction parallel to a surface of the plate, with exposure light and exposing a light converging pattern including a predetermined shape onto the plate;
- wherein at least part of the predetermined pattern exposed onto the plate in the first exposure step and at least part of the light converging pattern formed on the plate in the second exposure step overlap each other.
1 more element
An exposure method comprising:
- a first exposure step of exposing a predetermined first pattern onto a first region of a plate in a state in which the plate is still relative to the first pattern;
- a second exposure step of exposing a predetermined second pattern corresponding to a plurality of light converging portions onto the first region of the plate while relatively moving the plurality of light converging portions and the plate;
- and
- a movement step of relatively moving the plate and a position at which the first pattern is formed to expose the first pattern onto a second region of the plate that differs from the first region;
- wherein the second exposure step is performed when the movement step is performed, and wherein the plurality of light converging portions are arranged at predetermined distances from the first pattern in a direction parallel to a surface of the plate.
2 more elements
An exposure apparatus comprising:
- a first holding portion which holds a mask including a predetermined pattern near a plate;
- a second holding portion which holds a light converging pattern formation member that includes a plurality of light converging portions that form light patterns including predetermined shapes on the plate, such that the plurality of light converging portions are arranged near the plate and are located at predetermined distances from the mask in a direction parallel to a surface of the plate;
- and
- an illumination portion which irradiates the mask and the light converging pattern formation member with exposure light.
1 more element
An exposure apparatus comprising:
- a first exposure portion which exposes a predetermined first pattern onto a first region of a plate;
- a second exposure portion which exposes a predetermined second pattern onto the first region of the plate;
- a plate moving portion which moves the plate along a predetermined first direction;
- and
- a control unit which controls exposure with the first and second exposure portions and movement of the plate with the plate moving portion, wherein the control unit holds the first pattern and the plate in a relatively still state when the first exposure portion performs exposure, and the control unit performs exposure with the second exposure portion when relatively moving the plate and a position at which the first pattern is formed to expose the first pattern onto a second region that differs from the first region of the plate,
- wherein the second exposure portion includes a second holding portion that holds a light converging pattern formation member including a plurality of light converging portions that form a light pattern shaped in correspondence with the second pattern on the plate and are arranged near the plate and are located at predetermined distances from the first pattern in a direction parallel to a surface of the plate.
3 more elements
An exposure method for irradiating a plate with exposure light and forming a pattern on the plate, the method comprising:
- a first arrangement step of arranging a first region of the plate and a first surface of a first member so as to be spaced apart from each other by a first gap;
- a first exposure step of irradiating, via the first surface, the first region that is arranged in the first arrangement step with exposure light and exposing a first part of the pattern onto the first region;
- a second arrangement step of arranging the first region onto which the first part of the pattern has been exposed and a second surface of a second member so as to be spaced apart from each other by a second gap;
- and
- a second exposure step of irradiating, via the second surface, the first region that is arranged in the second arrangement step with the exposure light and exposing a second part of the pattern onto the first region,
- wherein the first arrangement step includes arranging the first surface in which one of a mask pattern and a plurality of light converging portions that form a light converging pattern has been provided;
- and
- wherein the second arrangement step includes arranging the second surface in which the other one of the mask pattern and the plurality of light converging portions has been provided, at a location separated from the one of the mask pattern and the plurality of light converging portions in a direction parallel to a surface of the plate.
5 more elements
An exposure apparatus for irradiating a plate with exposure light and forming a pattern on the plate, the exposure apparatus comprising:
- a plate holder that movably holds the plate;
- a first holding portion that holds a first member such that a first surface of the first member and a first region of the plate held by the plate holder are spaced apart from each other by a first gap;
- a first exposure portion which exposes, via the first surface, the first region spaced apart from the first surface by the first gap with the exposure light and exposing a first part of the pattern onto the first region;
- a second holding portion that holds a second member such that the first region onto which the first part of the pattern has been exposed and which is held by the plate holder and a second surface of the second member are spaced apart from each other by a second gap;
- and
- a second exposure portion that irradiates, via the second surface, the first region spaced apart from the second surface by the second gap with the exposure light and exposing a second part of the pattern onto the first region,
- wherein the first holding portion holds the first member including the first surface in which one of a mask pattern and a plurality of light converging portions that form a light converging pattern has been provided;
- and
- wherein the second holding portion holds the second member including the second surface in which the other one of the mask pattern and the plurality of light converging portions has been provided, at a location separated from the one of the mask pattern and the plurality of light converging portions in a direction parallel to a surface of the plate held by the plate holder.
6 more elements
Dependencies are inferred from the claim text.