Exposure apparatus, exposure method, and method for producing device
AssigneeNikon Corporation
InventorsHisashi Nishinaga, Ikuo Hikima, Mitsunori Toyoda, Masahiro Nakagawa, Tsuneyuki Hagiwara, Yasushi Mizuno, Naonori Kita, Osamu Tanitsu, Nozomu Emura
Life of this patent
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Abstract
A part of exposure beam through a liquid via a projection optical system enters a light-transmitting section, enters an optical member without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.
Claims12
A measuring system for the optical measurement of an optical imaging system which is provided to image a pattern arranged in an object surface of the imaging system in an image surface of the imaging system, the imaging system being designed as an immersion system for imaging with the aid of an immersion liquid arranged on an image-side of the imaging system, comprising:
- at least one chassis having a measuring unit, the chassis being provided to be arranged in a region of the immersion liquid, the chassis having a light transmitting section which is covered by a plate that is transparent to measuring radiation in order to protect the measuring unit from the immersion liquid, wherein the plate is provided with a protective member between the plate and the chassis and, during the measurement, the plate is arranged between the measuring unit and the immersion liquid.
A chassis for a measuring system for the optical measurement of an optical imaging system, the chassis having at least one measuring unit, the chassis having a light transmitting section which is covered by a plate that is transparent to measuring radiation in order to protect the measuring unit from immersion liquid, wherein the plate is provided with a protective member between the plate and the chassis and the plate is arranged over the measuring unit.
A chassis for a measuring system for the optical measurement of an optical imaging system, the chassis having an aperture structure, which is covered by a plate that is transparent to measuring radiation in order to protect the aperture structure from immersion liquid, wherein the plate is provided with a protective member between the plate and the chassis and the plate is arranged over the aperture structure.
Dependencies are inferred from the claim text.